Antistatic film, method for manufacturing the same, and display device including the same
US9753291B2 · kind B2 · utility
1Cited by
3References
12Claims
0Family size
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Key dates
| Filing date | Dec 6, 2013 |
| Grant date | Sep 5, 2017 |
| Priority date | — |
| Expiry date | Jun 25, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antistatic film includes a substrate, a lower coating layer positioned on the substrate and including a conductive material, tetraethyl orthosilicate (TEOS), and silsesquioxane (SSQ), and an upper coating layer positioned on the lower coating layer and including the conductive material and tetraethyl orthosilicate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.