Organoaminosilanes and methods for making same
US9758534B2 · kind B2 · utility
2Cited by
4References
8Claims
0Family size
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Key dates
| Filing date | Dec 2, 2015 |
| Grant date | Sep 12, 2017 |
| Priority date | — |
| Expiry date | Dec 2, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07F7/10
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Organoaminosilanes, such as without limitation di-iso-propylaminosilane (DIPAS), are precursors for the deposition of silicon containing films such as silicon-oxide and silicon-nitride films. Described herein are methods to make organoaminosilane compounds, or other compounds such as organoaminodisilanes and organoaminocarbosilanes, via the catalytic hydrosilylation of an imine by a silicon source comprising a hydridosilane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.