Acid-labile hyperbranched copolymer and associated photoresist composition and method of forming an electronic device
US9758610B2 · kind B2 · utility
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18References
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Key dates
| Filing date | Dec 18, 2015 |
| Grant date | Sep 12, 2017 |
| Priority date | — |
| Expiry date | Dec 18, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An acid-labile hyperbranched copolymer is formed by copolymerizing monomers that include a difunctional monomer and a mono(meth)acrylate ester. The difunctional monomer includes at least one formal group, acetal group, or ketal group that makes the copolymer acid-labile. The copolymer is useful as a component of a photoresist composition that provides low line width roughness, among other desirable photolithographic properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.