Inorganic passivation material, method for forming the same, and inorganic passivation protective film produced therefrom
US9758624B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 16, 2014 |
| Grant date | Sep 12, 2017 |
| Priority date | — |
| Expiry date | Aug 23, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G77/30
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method for forming an inorganic passivation material is provided. The method includes mixing about 5 to 80 parts by weight of trialkoxysilane, about 10 to 80 parts by weight of tetraalkoxysilane, and about 1 to 30 parts by weight of catalyst to perform a reaction at pH of about 0.05 to 4 to form an inorganic resin material. The inorganic resin material is modified by phosphate ester to form an inorganic passivation material, wherein phosphate ester is about 0.1-10 parts by weight based on 100 parts by weight of the inorganic resin material. An inorganic passivation material and a passivation protective film produced therefrom are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.