Patent · US Active

Methods of manufacturing a coated structure on a substrate

US9758858B2 · kind B2 · utility

0Cited by

13References

9Claims

0Family size

Assignees

Tyco Electronics Co., Ltd · US
TE Connectivity Germany GmbH · DE

Inventors

Soenke Sachs · Frankfurt am Main, DE
Helge Schmidt · Speyer, DE
Michael Leidner · Lambrecht, DE
Eva Henschel · Duisburg, DE
Dominique Freckmann · San Francisco, US
Marjorie Kay Myers · Mount Wolf, US

Key dates

Filing date	Mar 15, 2013
Grant date	Sep 12, 2017
Priority date	—
Expiry date	Aug 31, 2034

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/5873
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method of manufacturing a coated structure on a substrate includes positioning a substrate in a vapor deposition chamber having a crucible with source material. The method includes evaporating the source material with electron beams from an irradiation source, the evaporated source material being deposited on the substrate as a coating layer. The method includes ablating the coating layer with the electron beams to selectively remove portions of the coating layer leaving a circuit structure on the substrate. The evaporating and ablating are accomplished in situ within the vapor deposition chamber using the same irradiation source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.