Pellicle frame and pellicle
US9759996B2 · kind B2 · utility
0Cited by
5References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 6, 2015 |
| Grant date | Sep 12, 2017 |
| Priority date | — |
| Expiry date | Dec 7, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/62
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to a pellicle frame of a pellicle for use in photolithography, comprising: a coating of a layer containing a para-xylylene-based polymer. The invention can inhibit release of sulfate ions, ammonium ions and so on from the pellicle frame and thereby reduce the occurrence of haze under exposure environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.