Manufacturing method of color filter substrate
US9760001B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 30, 2014 |
| Grant date | Sep 12, 2017 |
| Priority date | — |
| Expiry date | Feb 25, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2032
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A manufacturing method of a color filter substrate includes: depositing a photoresist layer on a substrate, patterning the photoresist layer through exposure and development and executing an UV curing; or forming an overcoat whose material is a light-cured material on a substrate, conducting an UV irradiation on the substrate from front and back sides of the substrate, respectively; or, depositing a black matrix photoresist, a red photoresist, a green photoresist and a blue photoresist on a substrate, respectively, and forming corresponding patterns respectively through exposure and development and executing an UV curing. By the technical solution, the line-width of a BM can be restrained from broadening, and the curing time can be shortened, thereby raising the production efficiency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.