Conductive nanostructure-based films with improved ESD performance
US9763313B2 · kind B2 · utility
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Key dates
| Filing date | Apr 24, 2014 |
| Grant date | Sep 12, 2017 |
| Priority date | — |
| Expiry date | Nov 14, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49117
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Optical stacks containing one or more patterned transparent conductor layers may be damaged by electrostatic discharges that occur during the optical stack manufacturing process. Such damage may result in non-conductive conductors within the patterned transparent conductor layer. An electrostatic discharge protected optical stack may include a substrate layer, a first anti-static layer having a sheet resistance of from about 106 ohms per square (Ω/sq) to about 109 Ω/sq, and a patterned transparent conductor layer. Methods of testing and assessing damage to patterned transparent conductors are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.