Low temperature CVD coatings and applications thereof
US9764986B2 · kind B2 · utility
2Cited by
11References
20Claims
0Family size
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Key dates
| Filing date | Jan 22, 2015 |
| Grant date | Sep 19, 2017 |
| Priority date | — |
| Expiry date | Jul 25, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/34
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
In one aspect, articles employing CVD coatings deposited at low temperatures are described herein. Briefly, a coated article described herein comprises a substrate and a refractory coating adhered to the substrate, the refractory coating including a layer of TiN deposited by thermal CVD, the layer of TiN having an average crystallite size of 0.05 μm to 0.5 μm and residual tensile stress of 100 MPa to 700 MPa.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.