Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating
US9765175B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Sep 11, 2014 |
| Grant date | Sep 19, 2017 |
| Priority date | — |
| Expiry date | Sep 11, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0758
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Provided is a modified hydroxy naphthalene novolak resin which is optimal for a photosensitive composition and a resist material having high optical sensitivity, resolution, and alkali developability, and excellent heat resistance and moisture absorption resistance, and the modified hydroxy naphthalene novolak resin includes a structural moiety (I) represented by Structural Formula as a repeating unit:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.