Patent · US Active

Plasma treatment device and method for plasma treatment

US9767995B2 · kind B2 · utility

0Cited by
0References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 28, 2016
Grant dateSep 19, 2017
Priority date
Expiry dateJan 28, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H1/475
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A plasma treatment device having an electrode arrangement (3) for generating a plasma in a supplied gas stream. The electrode arrangement has at least one movably mounted electrode. The plasma is preferably a cold atmospheric pressure plasma and can be generated so as to vary in location by means of movement of the at least one electrode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.