Plasma treatment device and method for plasma treatment
US9767995B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | Jan 28, 2016 |
| Grant date | Sep 19, 2017 |
| Priority date | — |
| Expiry date | Jan 28, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/475
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma treatment device having an electrode arrangement (3) for generating a plasma in a supplied gas stream. The electrode arrangement has at least one movably mounted electrode. The plasma is preferably a cold atmospheric pressure plasma and can be generated so as to vary in location by means of movement of the at least one electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.