Patent · US Active

Non volatile resistive memory cell and its method of making

US9768379B2 · kind B2 · utility

4Cited by
3References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 6, 2016
Grant dateSep 19, 2017
Priority date
Expiry dateJan 6, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N70/8833

Abstract

A resistive non-volatile memory cell including a Metal-Insulation-Metal stack including two electrodes and a multilayer of insulation, placed between the two electrodes, including a thin layer of oxide allowing for a resistive transition and an oxygen vacancy reservoir layer is provided. The stack includes from bottom to top: the bottom electrode including a metal layer, the insulation including a layer of stoichiometric metal oxide and a layer of substoichiometric metal oxide forming the oxygen vacancy reservoir layer, and the top electrode including a layer of metal oxide and a metal layer, such that the oxygen vacancy reservoir layer is inserted between two metal oxide stoichiometric layers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.