Patent · US Active

Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture

US9770804B2 · kind B2 · utility

8Cited by
113References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 18, 2014
Grant dateSep 26, 2017
Priority date
Expiry dateMar 18, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/87652
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.