Patent · US Active

Cleansing composition containing oligodynamic metal and efficacy enhancing agent

US9771549B2 · kind B2 · utility

2Cited by

5References

5Claims

0Family size

Assignee

Conopco, Inc. · US

Inventors

Ajit Manohar Agarkhed · Saputara, IN
Nitish Kumar · Supaul, IN
Divya Paruchuri · Hyderabad, IN

Key dates

Filing date	Jan 6, 2015
Grant date	Sep 26, 2017
Priority date	—
Expiry date	Jan 6, 2035

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC11D10/042
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

In one aspect is disclosed a cleansing composition comprising: (i) a surfactant; (ii) an oligodynamic metal or ions thereof; (iii) a chelating agent; and, a polymer having a group comprising a site having one or more lone pair of electrons wherein, said surfactant is soap. The polymer having a group comprising a site having one or more lone pair of electrons enhances the antimicrobial efficacy of the oligodynamic metal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.