Multilayer structure offering improved impermeability to gases
US9771654B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 24, 2012 |
| Grant date | Sep 26, 2017 |
| Priority date | — |
| Expiry date | Feb 12, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24975
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A multilayer structure including a substrate and a first stack of a layer of SiO2 and a layer of material of the SiOxNyHz type positioned between the substrate and the layer of SiO2, in which the layer of SiO2 and the layer of material of the SiOxNyHz type have thicknesses (eB, eA) such that the thickness of the layer of SiO2 is less than or equal to 60 nm, the thickness of the layer of material of the SiOxNyHz type (eB) is more than twice the thickness (eA) of the layer of SiO2, and the sum of the thicknesses of the layer of SiO2 and of the layer of material of the SiOxNyHz type is between 100 nm and 500 nm, and in which z is strictly less than the ratio (x+y)/5, and advantageously z is strictly less than the ratio (x+y)/10.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.