Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same
US9772554B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 25, 2016 |
| Grant date | Sep 26, 2017 |
| Priority date | — |
| Expiry date | Feb 25, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2438/01
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.