Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresists
US9772558B2 · kind B2 · utility
3Cited by
6References
27Claims
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Key dates
| Filing date | Sep 24, 2013 |
| Grant date | Sep 26, 2017 |
| Priority date | — |
| Expiry date | Dec 11, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/40
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are chemically amplified resist compositions that include acid-labile sulfonate-ester photoresist polymers that are developable in an organic solvent. The chemically amplified resists produce high resolution positive tone development (PTD) and negative tone development (NTD) images depending on the selection of organic development solvent. Furthermore, the dissolution contrast of the traditional chemically amplified resists may be optimized for dual tone imaging through the addition of a photoresist polymer comprising an acid-labile sulfonate-ester moiety.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.