Method and functional architecture for inline repair of defective lithographically masked layers
US9773836B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2016 |
| Grant date | Sep 26, 2017 |
| Priority date | — |
| Expiry date | Dec 9, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136263
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing an sensor array includes providing a glass substrate; forming a bottom electrode layer over the glass substrate; forming a sensor material layer over the bottom electrode layer; forming a top electrode layer over the sensor material layer; patterning the top electrode layer, the sensor material layer, and the bottom electrode layer using a first photoresist layer to form a plurality of pixels; detecting a defect in the plurality of pixels; and patterning the plurality of pixels using a second photoresist layer. The first photoresist layer includes a plurality of first pixel patterns and the second photoresist layer comprises a plurality of second pixel patterns, and wherein at least one of the second pixel patterns has an area greater than that of a corresponding first pixel pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.