Method for depositing high aspect ratio molecular structures
US9776206B2 · kind B2 · utility
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4Claims
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Key dates
| Filing date | Jan 2, 2015 |
| Grant date | Oct 3, 2017 |
| Priority date | — |
| Expiry date | Jan 2, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/845
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for depositing high aspect ratio molecular structures (HARMS), which method comprises applying a force upon an aerosol comprising one or more HARM-structures, which force moves one or more HARM-structures based on one or more physical features and/or properties towards one or more predetermined locations for depositing one or more HARM-structures in a pattern by means of an applied force.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.