Chemical vapor deposition coating, article, and method
US9777368B2 · kind B2 · utility
13Cited by
26References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2010 |
| Grant date | Oct 3, 2017 |
| Priority date | — |
| Expiry date | Jul 31, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a chemical vapor deposition coating, a chemical vapor deposition article, and a chemical vapor deposition method. The coating, article, and method involve thermal decomposition of dimethylsilane to achieve desired surface properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.