Method for manufacturing array substrate, array substrate thereof and display device
US9780120B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | May 30, 2014 |
| Grant date | Oct 3, 2017 |
| Priority date | — |
| Expiry date | May 30, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/441
Abstract
The present disclosure provides a method for manufacturing an array substrate, an array substrate and a display device. The method includes: forming a gate line, a gate electrode and an insulating layer which covers the gate line and the gate electrode on a first surface of a substrate; forming a semiconductive film on the insulating layer; patterning the semiconductive film using the gate electrode and the gate line as a mask, so as to form an source semiconductive layer at a region where the gate line and the gate electrode are located; and manufacturing a target semiconductive layer using the source semiconductive layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.