Water treatment valve control system with rotary position sensor
US9783433B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2014 |
| Grant date | Oct 10, 2017 |
| Priority date | — |
| Expiry date | Apr 1, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2303/16
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
Water treatment and valve control systems and apparatuses, and methods of using the same, are disclosed. In some examples, the apparatuses, systems, and methods include use of a rotary position sensor and one or more rotatable elements configured to, when moving from an initial rotational position to subsequent rotational positions, move one or more element of a valve assembly. In various examples of the apparatuses, systems, and methods, the rotatable element rotates directly from one rotational position to another rotational position. In certain examples, the rotary position sensor measures an electrical resistance value to detect the rotational position of the rotatable element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.