Method of manufacturing micro-array substrate
US9783893B2 · kind B2 · utility
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2References
8Claims
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Key dates
| Filing date | Jul 8, 2015 |
| Grant date | Oct 10, 2017 |
| Priority date | — |
| Expiry date | Jul 8, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/31
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of manufacturing a microarray substrate having improved reliability and mass-production properties uses a vapor of a surface-reforming material, and includes washing a base substrate, supplying the vapor of the surface-reforming material into a container to which the base substrate is provided, and coupling the vapor of the surface-reforming material to a surface of the base substrate to form a self-assembled monolayer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.