Patent · US Active

Methods for fabricating an optoelectronic device

US9786843B2 · kind B2 · utility

1Cited by
3References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 16, 2013
Grant dateOct 10, 2017
Priority date
Expiry dateJun 19, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

The invention relates to methods for fabricating an optoelectronic device, including: directly applying a printing ink composition to a patterning process, wherein the printing ink composition includes (1) at least one compound selected from the group of compounds represented by Chemical Formula 1, Chemical Formula 2, Chemical Formula 3, and mixtures thereof as disclosed herein in an amount of 0.01-90 wt % based on the total weight of the composition and (2) at least one material for an optoelectronic device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.