Patent · US Active

Apparatus, system, and methods for weighing and positioning wafers

US9791309B2 · kind B2 · utility

1Cited by
13References
5Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 13, 2015
Grant dateOct 17, 2017
Priority date
Expiry dateJun 18, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S901/46
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An apparatus for characterizing a wafer comprising an aligner comprising a chuck for receiving and rotating the wafer, a sensor for detecting the position of the wafer as it is rotated, a first actuator for lowering and raising the wafer vertically, and a second actuator for moving the chuck horizontally; and a weighing scale comprising a weight sensor disposed proximate to the aligner, and a cantilevered arm extending laterally from the weight sensor over the chuck of the aligner, the cantilevered arm having a through hole surrounding the chuck. The chuck is vertically movable relative to the weighing scale from a first position in which the wafer is supported by the chuck to a second position in which the wafer is supported by the cantilevered arm of the weighing scale. A method for characterizing a wafer using the instant apparatus is also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.