Patent · US Active

Sensor apparatus for analyzing a gas mixture in a process chamber

US9791426B2 · kind B2 · utility

1Cited by

14References

12Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Gerit Ebelsberger · Birkenfeld, DE
Holger Hackstein · Dietzenbach, DE
Erhard Magori · Straubing, DE

Key dates

Filing date	Jun 25, 2015
Grant date	Oct 17, 2017
Priority date	—
Expiry date	Apr 13, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG01N1/2247
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A sensor apparatus for analyzing a gas in a process chamber, having a housing, a gas sensor for analyzing at least a part of the gas, the gas sensor being arranged at a determined position in the housing, a gas feed for connecting the housing to the process chamber to feed the part of the gas from the process chamber into the housing and to the determined position, and a gas discharge for discharging the gas from the housing, wherein the gas feed and the gas discharge are configured as tubes lying inside one another, characterized by a closure cap at the combustion chamber-side end of the tubes lying inside one another, the closure cap including an even number of at least four openings with the same area, which are connected alternately as a gas inlet and a gas outlet to the tubes lying inside one another is provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.