Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9793098B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2013 |
| Grant date | Oct 17, 2017 |
| Priority date | — |
| Expiry date | Apr 16, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3438
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A vacuum coating and plasma treatment system includes a magnetron cathode with a long edge and a short edge. The magnetic pole of the magnetron results in an electromagnetic barrier. At least one remote arc discharge is generated separate from the magnetron cathode and in close proximity to the cathode so that it is confined within a volume adjacent to the magnetron target. The remote arc discharge extends parallel to the long edge of the magnetron target and is defined by the surface of the target on one side and the electromagnetic barrier on all other sides. There is a remote arc discharge cathode hood and anode hood extending over the arc discharge and across the short edge of the magnetron cathode. Outside of the plasma assembly is a magnetic system creating magnetic field lines which extend into and confine the plasma in front of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.