Attenuator with improved fabrication consistency
US9798166B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2017 |
| Grant date | Oct 24, 2017 |
| Priority date | — |
| Expiry date | Jan 24, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/105
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming an attenuator on an optical device includes forming a ridge for a waveguide. The ridge is formed in a light-transmitting medium that is positioned on a base. The ridge extends upwards from slab regions of the light-transmitting medium. The method also includes forming trenches in the slab regions of the light-transmitting medium such that the trenches extend through the light-transmitting medium to the base. The trenches are formed such that the ridge is located between the trenches. The method also includes forming a semiconductor in a bottom of each of the trenches and then doping a region of each of the semiconductors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.