Patent · US Active

Multiple copolymer systems as templates for block copolymer nanolithography

US9798232B2 · kind B2 · utility

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4Claims

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Assignee

UNIVERSITY OF SOUTH CAROLINA · US

Inventors

Chuanbing Tang · Columbia, US
Christopher George HARDY · Greensburg, US
Alper Nese · Alameda, US
Jeffery Hakim Hayat · Uniontown, US

Key dates

Filing date	Oct 17, 2014
Grant date	Oct 24, 2017
Priority date	—
Expiry date	Oct 17, 2034

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08G2261/74
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

Methods are generally provided for preparing a polymeric composition that includes a grafted block copolymer. Methods are also generally provided for preparing a polymeric composition that includes a star block copolymer prepared from a central core molecule that includes a plurality of attachment moieties. Methods are also generally provided for preparing a polymeric composition that includes a linear block copolymer. Block copolymers are also generally provided. Multi-segmented linear block copolymers are also generally provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.