Method for producing a structure

US9798248B2 · kind B2 · utility

Assignee

• Nanoscribe Holding GmbH · DE

Inventors

• Joerg Hoffmann · Mettlach, DE
• Philipp Simon · Karlsruhe, DE
• Michael Thiel · Karlsruhe, DE
• Martin Hermatschweiler · Karlsruhe, DE
• Holger Fischer · Karlsruhe, DE

Key dates

• Filing date: Jul 16, 2015
• Grant date: Oct 24, 2017
• Expiry date: Jan 21, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/31764
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to a method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device, in that a plurality of partial structures are written sequentially, wherein for writing the partial structures a write field of the exposure device is displaced and positioned sequentially and that a partial structure is written in the write field in each case, and wherein for positioning of the write field a reference structure is detected by means of an imaging measuring device. For calibration of the write field in the respectively positioned write field, before, during or after writing a partial structure, at least one reference structure element assigned to this partial structure is produced in the lithographic material with the writing beam, wherein the reference structure element after the displacement of the write field is detected by means of the imaging measuring device for writing a further partial structure.