Thin film transistor array substrate, its manufacturing method and display device
US9799679B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 31, 2014 |
| Grant date | Oct 24, 2017 |
| Priority date | — |
| Expiry date | Jan 14, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure provides a thin film transistor (TFT) array substrate, its manufacturing method and a display device. The method includes steps of: forming patterns of a common electrode, a common electrode line, a gate line and a data line on a substrate by a single patterning process; forming an insulating layer; forming a pattern of an active layer by a single patterning process; forming a gate insulating layer and forming via-holes corresponding to the gate line, the data line and the active layer in the gate insulating layer by a single patterning process; and forming patterns of a pixel electrode, a gate electrode, a source electrode and a drain electrode by a single patterning process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.