Embedded noble metal electrodes in microfluidics

US9804122B2 · kind B2 · utility

Assignees

• International Business Machines Corporation · US
• BIONANO GENOMICS, INC. · US

Inventors

• Huan Hu · Yorktown Heights, US
• Michael F. Lofaro · Milton, US
• Joshua T. Smith · Hudson, US
• Daniel J. Solis · Austin, US
• Benjamin H. Wunsch · Armonk, US

Key dates

• Filing date: Nov 25, 2015
• Grant date: Oct 31, 2017
• Expiry date: Jan 24, 2036

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01L2400/0421
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A technique relates to manufacturing a nanogap. An oxide layer is disposed on top of a substrate. A release layer is disposed in a pattern on top of the oxide layer. A patterned trench is etched into the oxide layer using the pattern of the release layer. A metal layer is disposed on the release layer and in the patterned trench. A polish removes the release layer, thereby removing both the release layer and a portion of the metal layer having been disposed on top of the release layer, such that the metal layer remaining includes a first metal part and a second metal part connected by a metal nanowire. The metal layer remaining is coplanar with the oxide layer. A nanochannel is formed in the oxide layer in a region of the metal nanowire. The nanogap is formed in the metal nanowire separating the first and second metal parts.