Patent · US Active

Systems and methods for forming contact definitions

US9804491B1 · kind B1 · utility

0Cited by

10References

8Claims

0Family size

Assignee

University of South Florida · US

Inventors

Rudraskandan Ratnadurai · Tampa, US
Subramanian Krishnan · Bengaluru, IN
Shekhar Bhansali · Weston, US

Key dates

Filing date	Mar 30, 2016
Grant date	Oct 31, 2017
Priority date	—
Expiry date	Mar 30, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH10N70/00
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In one embodiment, a mask set for use in fabricating thin film tunneling devices includes a first photomask configured to form bottom electrodes of the devices, the first photomask comprising a first alignment mark including multiple corner markers, and a second photomask configured to form a continuous top layer of the devices, the second photomask comprising a second alignment mark including a corner marker configured to be aligned with one of the corner markers of the first photomask, wherein a degree of overlap between the bottom electrodes and the continuous top layer depends upon the corner marker of the first photomask with which the corner marker of the second photomask aligns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.