Interferometer system, lithography apparatus, and article manufacturing method
US9804510B2 · kind B2 · utility
9Cited by
9References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 13, 2014 |
| Grant date | Oct 31, 2017 |
| Priority date | — |
| Expiry date | Oct 13, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7049
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is an interferometer system that irradiates an object to be measured with measuring light to thereby measure the position of the object to be measured. The interferometer system includes a laser light source; an interferometer configured to separate laser light emitted from an emission opening of the laser light source into the measuring light and reference light; and an optical path protecting member configured to surround an optical axis such that the laser light passes through the inside thereof and of which one opening is in contact with the emission opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.