Fabrication of enhanced supercapacitors using atomic layer deposition of metal oxide on nanostructures
US9805880B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 21, 2015 |
| Grant date | Oct 31, 2017 |
| Priority date | — |
| Expiry date | Jun 4, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/13
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method to a fabricate high surface area, high performance supercapacitor includes include applying a metal layer to at least a portion of a nanostructure; after applying the metal layer, oxidizing the metal layer; applying a plurality of additional metal layers onto a previously oxidized metal layer; and after applying each additional metal layer, oxidizing the additional metal layer prior to applying a successive additional metal layer. The metal layers may include a composition comprising at least one metal, the at least one metal selected from the group consisting of ruthenium, titanium, manganese, vanadium, iron, tin, cobalt and nickel. Optionally, each of the additional metal layers may be applied using atomic layering deposition (ALD).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.