Patent · US Active

Plasma source

US9805918B2 · kind B2 · utility

0Cited by

4References

15Claims

0Family size

Assignee

ARCELORMITTAL INVESTIGACIÓN Y DESARROLLO, S.L. · ES

Inventors

Florin Daniel Duminica · Esneux, BE
Vincent Leclercq · Dison, BE
Eric Silberberg · Haltinne, BE
Alain Daniel · Hannut, BE

Key dates

Filing date	Feb 6, 2013
Grant date	Oct 31, 2017
Priority date	—
Expiry date	Feb 6, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH05H1/466
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a plasma source (1) for depositing a coating onto a substrate (9), which is connectable to a power source (P) and includes: an electrode (2); a magnetic assembly (4) located circumferentially relative to said electrode and including a set of magnets mutually connected by a magnetic bracket (46) including a first and second central magnet (43, 44) and at least one head magnet (45); and an electrically insulating enclosure (5) arranged such as to surround the electrode and the magnets.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.