Patent · US Active

Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure

US9809876B2 · kind B2 · utility

0Cited by

9References

13Claims

0Family size

Assignee

Centre Luxembourgeois de Recherches pour le Verre et la Ceramique S.A. (C.R.V.C.) · LU

Inventors

Gilbert GALAN · Dudelange, LU
Jean-Philippe USELDING · Arlon, BE
Guy Comans · Neufchâteau, BE
Marcel Schloremberg · Arlon, BE

Key dates

Filing date	Jan 13, 2014
Grant date	Nov 7, 2017
Priority date	—
Expiry date	Jun 9, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/332
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.