Dual light source enhanced integration system
US9810891B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 15, 2015 |
| Grant date | Nov 7, 2017 |
| Priority date | — |
| Expiry date | Aug 6, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B21/208
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A dual light source enhanced integration system is provided. The system comprises: a first light source and a second light source with overlapping spectra; a light integrator configured to integrate light and having a first light entrance face and a second light entrance face; and, a beamsplitter system configured to about equally distribute light from each of the first light source and the second light source to each of the first light entrance face and the second light entrance face, such that the light from each of the first light source and the second light source is about equally combined at each of the first light entrance face and the second light entrance face.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.