Cleaning device and cleaning process for a plasma reactor
US9812298B2 · kind B2 · utility
0Cited by
9References
6Claims
0Family size
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Key dates
| Filing date | Jun 24, 2014 |
| Grant date | Nov 7, 2017 |
| Priority date | — |
| Expiry date | Jun 6, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67069
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises means (13, 14) for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.