System for phasing a large number of laser sources
US9812840B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 2015 |
| Grant date | Nov 7, 2017 |
| Priority date | — |
| Expiry date | May 26, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for phasing periodically configured laser sources, which comprises: means for collimating and directing the beams arising from the sources onto a combining diffractive optical element with a periodic phase grating, with an angle of incidence that differs from one beam to the next, these angles of incidence being determined according to the period of the grating; means for controlling the phases of the sources based on a negative feedback signal arising from the combined beams; means for drawing off a fraction of the combined beams; on the path of this fraction of the beams, a Fourier lens, with the combining diffractive optical element in its object plane; a matrix of detectors in the image plane of the Fourier lens, capable of detecting intensity distributions; means for calculating the negative feedback signal based on these intensity distributions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.