Plasma deposition process with removal of substrate tube
US9816179B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2015 |
| Grant date | Nov 14, 2017 |
| Priority date | — |
| Expiry date | Dec 31, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/402
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed are methods for manufacturing a precursor for a primary preform for optical fibers via an internal plasma deposition process. An exemplary method includes creating a first plasma reaction zone having first reaction conditions in the interior of a hollow substrate tube to deposit non-vitrified silica layers on the inner surface of the hollow substrate tube, and subsequently creating a second plasma reaction zone having second reaction conditions in the interior of the hollow substrate tube to deposit vitrified silica layers on the deposited, non-vitrified silica layers. Thereafter, the hollow substrate tube is removed from the deposited, vitrified silica layers to yield a deposited tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.