Quantum dot color filter substrate and manufacturing method thereof
US9817264B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 28, 2015 |
| Grant date | Nov 14, 2017 |
| Priority date | — |
| Expiry date | Apr 2, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention discloses a QD CF substrate and manufacturing method thereof. The manufacturing method uses a patterned photo-resist layer as a masking layer to perform selective quenching on QD layer with a quencher to obtain selectively quenched QD layer, which simplifies QD CF substrate manufacturing process and reduces cost. The QD CF substrate does not use blue QD material in QD layer, but uses blue backlight and organic transparent photo-resist layer to improve light utilization efficiency and reduce material cost. The QD layer is a selectively quenched QD layer, and the portion of the QD layer located above the organic transparent photo-resist layer is quenched by the quencher, and will not emit light when excited by backlight. As such, the invention achieves using the QD material to improve color gamut and brightness, avoid color impurity at blue sub-pixels caused by light mixture, and the manufacturing method is simple.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.