Extreme ultraviolet (EUV) pod having marks
US9817306B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 23, 2015 |
| Grant date | Nov 14, 2017 |
| Priority date | — |
| Expiry date | Jan 22, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/66
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an EUV pod having marks, which comprises a mask pod and one or more mark disposed on the mask pod. One or more sensor of a processing machine is used for detecting the one or more mark. By including the one or more mark, the surface roughness of one or more region of the mask pod detectable by the one or more sensor can be altered. The one or more sensor emits light to the mask pod, which reflects the light to the one or more sensor. The one or more sensor receives the reflection light from the mask pod and judges if the voltage generated by the reflection light falls within the reflection ranges of the mark. Thereby, whether the one or more sensor corresponds to the one or more make can be confirmed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.