Photoimageable compositions containing photobase generators
US9823565B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | Feb 12, 2016 |
| Grant date | Nov 21, 2017 |
| Priority date | — |
| Expiry date | Feb 12, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0751
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments in accordance with the present invention encompass negative-tone, solvent developable, self-imageable polymer compositions containing photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.