Microcrystalline silicon thin film solar cell and the manufacturing method thereof
US9825196B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | Mar 11, 2015 |
| Grant date | Nov 21, 2017 |
| Priority date | — |
| Expiry date | Jun 30, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
The present invention relates to a microcrystalline silicon thin film solar cell and the manufacturing method thereof, using which not only the crystallinity of a microcrystalline silicon thin film that is to be formed by the manufacturing method can be controlled and adjusted at will and the defects in the microcrystalline silicon thin film can be fixed, but also the device characteristic degradation due to chamber contamination happening in the manufacturing process, such as plasma enhanced chemical vapor deposition (PECVD), can be eliminated effectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.