Electromagnetic wave refraction via controlled plasma
US9826621B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 10, 2016 |
| Grant date | Nov 21, 2017 |
| Priority date | — |
| Expiry date | Nov 10, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01Q15/0006
- WIPO fieldTelecommunications
- WIPO sectorElectrical engineering
Abstract
Systems and methods are provided for redirecting electromagnetic radiation around an object. A first assembly, including a first interior wall and a first exterior wall enclosing a propellant gas, substantially encloses the object. A first control system is configured to energize the propellant gas to provide a first volume of plasma and control an electron number density of the first volume of plasma. The electron number density of the first volume of plasma is selected to minimize reflection of the electromagnetic radiation from the first exterior wall. A second assembly includes a second interior wall and a second exterior wall enclosing a propellant gas and is substantially concentric with the first assembly and substantially encloses the object. A second control system is configured to energize the propellant gas to provide a second volume of plasma and control an electron number density of the second volume of plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.