Low-moisture cloud-making cleaning article
US9826876B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 30, 2013 |
| Grant date | Nov 28, 2017 |
| Priority date | — |
| Expiry date | Apr 7, 2034 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD04H1/00
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A cleaning article includes a cleaning article sheet comprising a fabric substrate, wherein the fabric substrate includes pores therein, and wherein the fabric substrate has a background moisture percentage by weight, and liquid water disposed substantially and disconnectedly within the pores, wherein the liquid water is at moisture percentage by weight that is 5 to 150 percentage points higher than the background moisture percentage. The nonwoven substrate can include pores formed between and/or within the fibers and can have a background moisture percentage by weight. The substrate can include a treatment to increase the dielectric constant from the dielectric constant of the substrate without the treatment. The moisture of the article can be configured to exhibit a dielectric constant of at least 50% and up to 600% higher than the dielectric constant of the same article with only background moisture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.