Patent · US Active

Wafer dryer apparatus and method

US9829249B2 · kind B2 · utility

11Cited by
26References
30Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 2, 2016
Grant dateNov 28, 2017
Priority date—
Expiry dateMar 2, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/02057
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.