Flow lithography technique to form microstructures using optical arrays
US9829798B2 · kind B2 · utility
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31Claims
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Key dates
| Filing date | Mar 15, 2013 |
| Grant date | Nov 28, 2017 |
| Priority date | — |
| Expiry date | Jun 1, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/24
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A continuous flow projection lithography system to form microstructures using an optical array incorporated in a continuous coating process is provided. A mask is placed at a distance from the array. Each element of the array projects one image of the mask onto a substrate, effectively forming an array thereon. A coating process allows flows that can be used to define functional regions of particles or supporting layers that prevent adhesion of crosslinked polymers to surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.