Patent · US Active

Die-cutting approaches for foil-based metallization of solar cells

US9831377B2 · kind B2 · utility

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20Claims
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Key dates

Filing dateFeb 29, 2016
Grant dateNov 28, 2017
Priority date
Expiry dateFeb 29, 2036

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50

Abstract

Die-cutting approaches for foil-based metallization of solar cells, and the resulting solar cells are disclosed herein. Die-cutting approaches for foil-based metallization of solar cells include forming a plurality of semiconductor regions in or above a substrate and forming a patterned damage buffer in alignment with locations between the plurality of semiconductor regions. Additionally, a metal layer comprising a metal seed layer and/or metal foil is formed over the patterned damage buffer. The metal layer is cut by a cutting die at locations between the plurality of semiconductor regions by applying a mechanical force to the cutting die.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.